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Skyspring Nanomaterials上海代理

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Skysprin上海代理
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SkySpring Nanomaterials是一家通過ISO 9001認證的納米顆粒，納米粉末，微米粉末和CNT（碳納米管）的小批量供應商，供研究和批量訂購。

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產品介紹

創亞化工（上海）有限公司是一家致力于生命科學和生物技術領域的高科技企業。公司由在國內科研試劑領域有著十幾年從業經驗的專業技術團隊和企業管理團隊組建而成，專門從事以抗體、細胞因子、免疫檢測試劑盒等免疫學產品為主的生物試劑的研發與銷售。

Skyspring Nanomaterials上海代理*Beckman A63881的磁珠現貨，moltox 11-101.5等現貨，transgenomic 706020/706025現貨，Megazyme的大部分現貨，LIST現貨，、ALZET大量現貨，

Skyspring Nanomaterials上海代理Avanti 、tedpella 、BioLegend、Polyplus、jena bioscience、Mattek、MRC-Holland、polysciences、enzo、novus、TOCRIS、CAYMAN、Neuro Probe、cyguns、eylabs、NIBSC、chondrex、lc laboratories、BTI、etonbio

Skyspring Nanomaterials上海代理

：楊旖

：15021505715 021-61525262

:chuangyabio

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Skyspring Nanomaterials上海代理

0115CY Ag, 99.95%, 100nm

0118XH Ag, 99.95%, 20-30nm

0120XH Ag, 99.95%, 20-30nm, PVP coated

0121XH Ag, 99.9%, 50-60nm

0123NJ Ag, 99.99%, 30-50nm, oleic acid coated

0124DX Ag, 99.9%, 200-400nm

0125DX Ag, 99.9%, 500-800 nm

0127SH Ag, 99.99%, 15nm, 25wt%, self-dispersible

0129HN Ag, nanowires

0200SJ Al, 99.9%, 18nm

0220XH Al, 99.7%, 40-60nm

0221XH Al, 99.7%, 60-80nm

0226XH Al, 99.7%, 100~130nm

0230HJ Al, 98%, 1~2um

0231NG Al, 99%, 1um, Spherical

0232NG Al, 99%, 2um, Spherical

0233NG Al, 99%, 5um, Spherical

0271DX Al-Si, 1~2um

0272DX Al-Si, 4~5um

0310DX Au, 99.99%, 50-100nm

0311DX Au, 99.9%, 20nm

0400BZ B, 99.9999%

0401BZ B, 99.999%

0402BZ B, 99.99%

0403BZ B, 99.9%

0410DX B, 99.9%, <100nm

0470DX Bi, 99.9%, <100nm

0480DX Bi, 99.0+%, -325 mesh

0490DX Bi, 99%, <25um

0510HZ Diamond, 95%, 3-4nm

0511HZ Diamond, 93%, 3-4nm

0512HZ Diamond, 55-75 %, 4-15nm

0520BX Graphite, 93%, 3-4nm

0522DX Graphite, 95%, <100nm

0521QZ Graphite, natural flake, 99%, 1um

0540DX Graphene Nanopowder (1-5 nm)

0541DX Graphene Nanopowder (6-8 nm)

0544DX Graphene Nanopowder (11-15 nm)

0530HT Super Activated Carbon, 100nm

0539DX Carbon Powder,99.99%

0610SJ Co, 99.8%, 25-30nm

0617SJ Co, C coated, 25~30nm

0721XH Cr, 99.7%, 60-80nm

0731DX Cr, 99.5%, ~5um

0851HN Cu, 5-7nm, dispersion, oil soluble

0800SJ Cu, 99.8%, 25nm

0820XH Cu, 99.9%, 40-60nm

0821XH Cu, 99.9%, 60-80nm

0824XH Cu, 99.9%, 100~130nm

0811DX Cu, 99.5%, 300nm

0810DX Cu, 99.8%, 500nm

0809NG Cu, 99.8%, 1um

0881NW Cu nanowires, 150nm immersed in ethanol

0882NW Cu nanowires, 300nm

0883NW Cu nanowires, 300nm immersed in ethanol

0915SJ Fe, 99.9%, 25nm

0922XH Fe, 99.7+%, 40-60nm

0923XH Fe, 99.7+%, 60-80nm

0924XH Fe, 99.7+%, 100~130nm

0961XH Stainless Steel 316L, 60-80nm

0990JH Carbonyl-Fe, micro-sized

3606DX Ge, 99.8+%, <200 nm

9120XH Mo, 99.7%, 40-60nm

9121XH Mo, 99.7%, 60-80nm

9130CN Mo, 99.9%, 0.5-0.8um

9213SG Ni, 99.9%, 1.0-1.5um

9225SJ Ni, 99.9%, 20nm

9227SJ Ni coated with carbon, 99.9%, 20nm

9220XH Ni, 99.7%, 40-60nm

9221XH Ni, 99.7%, 60-80nm

9210NG Ni, 99.9%, 500nm

9211NG Ni, 99.9%, 180nm

9215XH Ni, 99.8%, 80~150nm

9216NG Ni, 99.9%, 300nm

9230DX Ni, 99.9%, -325mesh

9290JH Carbonyl-Ni, 2-3um

9291DX Carbonyl-Ni, 4-7um

9293JH Carbonyl-Ni-Al (Ni Shell, Al Core)

9295JH Carbonyl-Ni-Fe Alloy

9410DX Pt, 99.9%, 200nm

9712HK Si, 99%, 100nm

9715DX Si, 99.9%, 500nm

9717HK Si, 99%, 30nm

9717DX Si, 99%, 50nm

9718DX Si, 99.999%, -325mesh

9719DX Si, 99.9+%, -200/+325 mesh

9720DG Si, Polycrystalline, 99.99995%, lumps

1021XH Sn, 99.7%, <100nm

1110XH Ta, 99.7%, 60-80nm

1123XH Ti, 99.9%, 40-60nm

1124XH Ti, 99.9%, 60-80nm

1126XH Ti, 99.9%, 40~60nm, PVP coated

1131DX Ti, 99.5%, ~6um

9820XH W, 99.7%, 40-60nm

9821XH W, 99.7%, 80-100nm

9920XH Zn, 99.7%, 40-60nm

9921XH Zn, 99.7%, 80-100nm

9990DX Zn, 99.9%, -325mesh

1315TB AlOOH, 10-20nm, 99.99%

1319NH Al₂O₃alpha, 99.0%, 40nm

1318DL Al₂O₃ alpha, 99.999%, 0.5-10um

1317NH Al₂O₃ alpha, 99.0%, 150nm

1320DL Al₂O₃ alpha, 99.9%, 50nm

1329DX Al₂O₃ alpha, 99.85%, 90~150nm

1321DL Al₂O₃ alpha, 99.99%, 0.3-0.8um

1324DL Al₂O₃ alpha, 99.99%, 3.5-15um

1328QI Al₂O₃ gamma, 99.9%, 5nm

1330DL Al₂O₃ gamma, 99.9%, 20nm

1331DL Al₂O₃ gamma, 99.9%, 0.4-1.5um

1338GJ Al2O3 Alpha, 99.999%, 5~8um

1340DL Al₂O₃, alpha, 99%, <100nm, hydrophobic coating

1340DX Aluminum Zinc Oxide Micropowder

1341DL Al(OH)₃, 99.99%, 30-100nm

1342DL Al(OH)₃, 99.99%, 2-10um

1360HK AlN, 99%, 40nm

1366HM Al(NO3)3, -325mesh

1401GC BaTiO₃, 99.9%, 100nm

1520DX B₂O₃, 99.5%, 80nm

1531DX B2O3, 98%, - 200mesh

1522DX BN, 99.5+%, 100nm

1526BZ BN, 99.99%, 3-4um

1527BZ BN, 99.9%, 3-4um

1540HK B4C, 99+%, 50nm

1710CY Bi₂O₃, 99.9%, <200nm

1712DX Bi2O3, 99.9%, 5~20um

1950RH CaCO₃, 97.5%, 15-40nm, paste

1951RH CaCO₃, 97.5%, 15-40nm

1952RH CaCO₃, 15-40nm, surface modified for water-based latex paint

1953RH CaCO₃, 15-40nm, surface modified for plastic, PE/PP

1954RH CaCO₃, 15-40nm, surface modified for plastic, PVC

1955RH CaCO₃, 15-40nm, surface modified for printing inks

1956RH CaCO₃, 15-40nm, surface modified for rubber

1957RH CaCO₃, 15-40nm, surface modified for adhesives

1970NE Ca₁₀(PO₄)₆(OH)₂, 98.5%, 40nm

2110CG CeO₂, 99.9%, 10-30nm

2113CG CeO₂, 99.9%, 0.1-1.0um

2115DX CeO₂, 99.9%, 1.0~3.0um

2118CG CeO₂, 99.9%, ~5um

2161DX CeO₂ doped with 10mol% Gd₂O₃, <100nm
2196DX CeF₃, 99.9%

2310SC CoO, <100nm

2320SC Co₂O₃, <100nm

2330SC Co₃O₄, 50nm

2510DX CsNO₃, 99.9%

2511DX CsOH, 99.9%

2512DX CsOH, 50% Solution

2513DX Cs₂CO₃, 99.9%

2514DX CsF, 99.9%

2515DX CsI, 99.99%

2516DX CsCOOH, 80% Solution

2518DX CsCl, 99.9%

2519DX Cs₂SO₄, 99.95%

2520DX Cs₂SO₄, 50% Solution

2810NH CuO, 99+%, 40nm

2910DX Dy₂O₃, 99.9+%, 50nm

3010DX Er₂O₃, 99.9%, 40-50nm

3011DX Er₂O₃, 99.9%, 10um

3013DX Er2O3, 99.9%, 1um

3015DX Er₂O₃, 99.5%, 200 mesh

3110DX Eu₂O₃, 99.99%, 50nm

3111DX Eu₂O₃, 99.9%, 2-3um

3310DX Fe₂O₃ alpha, 99%, 20-40nm

3315DX Fe₂O₃ gamma, 99%, 20-40nm

3320DX Fe₃O₄, 98+%, 20-30nm

3510CG Gd₂O₃, 99.9%, <100nm

3590DX Gd₂O₃, 99.9%

3810XX HfO₂, 99.9%, 100nm

3912DX Ho₂O₃, 99.9%

4110CB ITO, In₂O₃:SnO₂=90:10, 20-70nm, yellow

4111CB ITO, In₂O₃:SnO₂=95:5, 20-70nm, yellow

4112CB ITO, In₂O₃:SnO₂=90:10, 20-70nm, blue

4113CB ITO, In₂O₃:SnO₂=95:5, 20-70nm, blue

4115CB In₂O₃, 99.99%, 20-70nm

4116DX In₂O₃, 99.999%

4430DX LaB₆, 99.0%, 50-80nm

4410CG La₂O₃, 99.99%, 100nm

4411CG La₂O₃, 99.9%, 0.3-0.5 micron

4441CG La₂O₃, 99.9%
4460DX LaF₃, 99.5%
4712DX Lu₂O₃, 99.99%

4631HS LiCO2, 99.5%, ~5um

4632HS LiCO2, 99.5%, ~10um

4800DL MgO, 99.9%, 10-30nm

4810NH MgO, 99%, 20nm

4801DL MgO, 99.9%, 10-30nm, treated with Stearic Acid

4804DL MgO, 99.5%, <50um

4832SS Mg(OH)₂, 99.8%, 50nm

4910DX Mn₂O₃, 98+%, 40-60nm

4930DX MnO₂, 99+%, 5um

4950DX MnCl₂, 99+%, 5um

5010DX MoO₃, 99.5%, <100nm

5030CH MoCl₅, 99%

5220DX Nb₂O₅, 99.9%, 500nm

5221DX NbC, -100/+270 mesh
5310CG Nd₂O₃, 99.9%, <100nm
5311DX Nd₂O₃, 99.9%, 3-5um

5390DX NdF₃, 99.5%

5410SC NiO, 99.9%, 50nm

5911DX Pr₆O₁₁, 99.9%, 3-5um

5910DX Pr6O11, 99.9%, <100nm

5992DX PrF₃, 99.99%

6110DX Rb₂CO₃ 99.9%

6111DX RbNO₃ 99.9%
6112DX RbCl_, 99.9%

6113DX RbI 99.9%
6114DX RbF, 99.9%

6115DX RbOH 99.9%

6116DX Rb₂SO₄ 99.9%

6117DX Rb₃PO₄ 99.9%

6510SH S, 99.99%, <55nm

6610CY Sb₂O₃, 99.9%, 150nm

6807NM SiO₂, 99.5%, 15-20nm, porous

6808NM SiO₂, 99.5%, 20nm, non-porous

6809NM SiO₂, 98.7%, 10~20nm, non-porous

6811DL SiO2, 99%, 10-30nm, treated with Silane Coupling Agents

6851HN SiO₂, 10-20nm, modified with amino group, dispersible

6852HN SiO₂, 10-20nm, modified with epoxy group, dispersible

6853HN SiO₂, 10-20nm, modified with double bond, dispersible

6861HN SiO₂, 10-20nm, surface modified with double layer, dispersible

6862HN SiO₂, 10-20nm, surface modified, super-hydrophobic & oleophilic, dispersible

6863HN SiO₂, 99.8%, 5-15nm, surface modified, hydrophobic & oleophilic, dispersible

6864HN SiO₂, 99.8%, 10-25nm, surface modified, super-hydrophobic, dispersible

6820HK SiC, beta, 99%, 40nm

6880XH SiC, beta, whisker, 99+%

6830HK Si₃N₄, amorphous, 99%, 20nm

6835HM Si₃N₄, 99.5%, 0.5-1.0um

6835HK Si₃N₄ alpha, 97.5-99%, fiber, 100nmX800nm

6911DX Sm₂O₃, 99.9%,3-5 micron

6910DX Sm2O3, 99.9%, <100nm

7012LC SnO₂, 99.9%, 50-70nm

7012DX Sc₂O₃, 99.99%, 3-5um

7050NH ATO, SnO2:Sb2O3=90:10, 40nm

7191DX SrCO₃, 99.9%, <500nm

7340DX Ta₂O₅, 99.99%, <1 micron

7411DX Tb₄O₇, 99.9%, 3-5um

7511DX Tm₂O₃, 99.9%, 3-5um

7910DL TiO₂ anatase, 99.5%, 10-30 nm

7930DL TiO₂ anatase, 99.9%, 5 nm

7920SCDL TiO₂, Rutile, Silane Coated, 99.5%, 10~30nm

7918DL TiO₂ anatase + Rutile, 99.5%,10-30nm

7920DL TiO₂ Rutile, 99.5%, 10-30nm

7921DL TiO₂ Rutile coated with SiO2, 99%, 20~40nm

7940HK TiC, 99%, 40nm

7945HK TiN, 97+%, 20nm

8010CN WO₃, 99.5%, <100nm

8020CH WS₂, 99.9%, 0.8um

8005DX WC, 99.95%, 80nm

8170DX VC, 99+%, -100/+270mesh

8210CG Y₂O₃, 99.995%, 30-50nm

8211CG Y₂O₃, 99.995%, 0.5-1.0um

8212CG Y₂O₃, 99.995%, 1.0-2.0um

8223CG Y₂O₃, 99.999%, 3.0um

8290DX YF₃, 99.9%

8310DX YbF₃, 99.9%, 3-5um

8311DX Yb₂O₃, 99.9%, 3-5um

8410DL ZnO, 99.8%, <30nm

8411DL ZnO, 99%, 10-30nm, treated with silane coupling agents

8415CY ZnO, 99.8%, 200nm

8416DX ZnO, ultra high purity 99.999%

8418DX ZnO ( Al2O3 doped), 40nm

8501YS ZrO₂, 99.9%, 1-3um

8503DX ZrO2 in water, 2~5nm

8512QI ZrO₂, 99.9%, 20-30nm

8520DL ZrO₂-3Y, 99.9%, 0.3-0.5um

8522QI ZrO₂- 3Y, 25nm

8528QI ZrO₂- 5Y, 20-30nm

8531DL ZrO₂- 8Y, 0.8um

8532QI ZrO₂- 8Y, 20nm

8540HK ZrC, 97+%, 60nm

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